Effect of current direction on the lifetime of different levels of Cu dual-damascene metallization

10.1063/1.1428410

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Bibliographic Details
Main Authors: Gan, C.L., Thompson, C.V., Pey, K.L., Choi, W.K., Tay, H.L., Yu, B., Radhakrishnan, M.K.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82194
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Institution: National University of Singapore

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