Nickel silicidation on polycrystalline silicon germanium films

International Journal of Modern Physics B

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Bibliographic Details
Main Authors: Choi, W.K., Pey, K.L., Zhao, H.B., Osipowicz, T., Shen, Z.X.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84011
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Institution: National University of Singapore

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