Nickel silicidation on polycrystalline silicon germanium films

Nickel silicidation on polycrystalline silicon germanium films

International Journal of Modern Physics B

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書目詳細資料
Main Authors:	Choi, W.K., Pey, K.L., Zhao, H.B., Osipowicz, T., Shen, Z.X.
其他作者:	ELECTRICAL & COMPUTER ENGINEERING
格式:	Conference or Workshop Item
出版:	2014
在線閱讀:	http://scholarbank.nus.edu.sg/handle/10635/84011
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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