Investigation of multilayer thin films using ellipsometry
Spectroscopic Ellipsometry (SE) is a powerful and universal optical technique for the investigation of optical properties of semiconductor thin films. It is an extremely sensitive measurement tool for the characterization of single layer thin film and even multilayer structures. This project focus...
Saved in:
主要作者: | He, Lining. |
---|---|
其他作者: | Rusli |
格式: | Final Year Project |
語言: | English |
出版: |
2009
|
主題: | |
在線閱讀: | http://hdl.handle.net/10356/16800 |
標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|
機構: | Nanyang Technological University |
語言: | English |
相似書籍
-
Investigation of multilayer thin films using ellipsometry
由: Tikkiwal Vinay Anand.
出版: (2013) -
To investigate the mechanical/adhesion properties and mechanical reliability of thin films in electronics materials
由: Wan, Kai Tak
出版: (2008) -
Fabrication and characterization of MR thin films using IBS system
由: Qian, Yin
出版: (2009) -
Characterization of multifunctional thin films and electronic devices
由: Aung, Thu Phyo
出版: (2010) -
Fabrication and characterisation of tetrahedral amorphous carbon thin films
由: Li, Zhong
出版: (2010)