Degradation of high-frequency noise in nMOSFETs under different modes of hot-carrier stress

In this paper, high-frequency noise under different hot-carrier (HC) stress modes in nMOSFETs has been characterized and analyzed. The experimental results revealed a significant larger increase in NFmin and Rn under maximum substrate current IB, max stress or hot hole injection Hinj than hot electr...

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Bibliographic Details
Main Authors: Liao, Hong, Hu, Hang, Su, Hao, Wang, Hong
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2013
Subjects:
Online Access:https://hdl.handle.net/10356/98943
http://hdl.handle.net/10220/13449
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Institution: Nanyang Technological University
Language: English

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