Degradation of high-frequency noise in nMOSFETs under different modes of hot-carrier stress
In this paper, high-frequency noise under different hot-carrier (HC) stress modes in nMOSFETs has been characterized and analyzed. The experimental results revealed a significant larger increase in NFmin and Rn under maximum substrate current IB, max stress or hot hole injection Hinj than hot electr...
Saved in:
Main Authors: | Liao, Hong, Hu, Hang, Su, Hao, Wang, Hong |
---|---|
Other Authors: | School of Electrical and Electronic Engineering |
Format: | Article |
Language: | English |
Published: |
2013
|
Subjects: | |
Online Access: | https://hdl.handle.net/10356/98943 http://hdl.handle.net/10220/13449 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Language: | English |
Similar Items
-
Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing
by: Oh, G.G., et al.
Published: (2014) -
Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing
by: Oh, G.G., et al.
Published: (2014) -
On the time-dependent degradation of LDD n-MOSFETs under hot-carrier stress
by: Ang, D.S., et al.
Published: (2014) -
Study of hot carrier degradation in NMOSFET's by gate capacitance and charge pumping current
by: Ling, C.H., et al.
Published: (2014) -
Channel-width effect on hot-carrier degradation in NMOSFETs with recessed-LOCOS isolation structures
by: Yue, J.M.P., et al.
Published: (2014)