Threshold voltage instabilities in MOS transistors with advanced gate dielectrics
Ph.D
Saved in:
主要作者: | SHEN CHEN |
---|---|
其他作者: | ELECTRICAL & COMPUTER ENGINEERING |
格式: | Theses and Dissertations |
語言: | English |
出版: |
2010
|
主題: | |
在線閱讀: | http://scholarbank.nus.edu.sg/handle/10635/15856 |
標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|
機構: | National University of Singapore |
語言: | English |
相似書籍
-
Reliability analysis of thin HfO2/SiO2 gate dielectric stack
由: Samanta, P., et al.
出版: (2014) -
Reliability and characterization for deep sub-micron CMOS devices
由: CHEN GANG
出版: (2010) -
Effect of strain on negative bias temperature instability of germanium p-channel field-effect transistor with high-κ gate dielectric
由: Liu, B., et al.
出版: (2014) -
Gate stack engineering of germanium mosfets with high-K dielectrics
由: WU NAN
出版: (2010) -
Development and characterization of high-k dielectric/germanium gate stack
由: XIE RUILONG
出版: (2010)