Fabrication of ultra-shallow junctions and advanced gate stacks for ULSI technologies using laser thermal processing
Ph.D
Saved in:
Main Author: | CHONG YUNG FU |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Theses and Dissertations |
Language: | English |
Published: |
2011
|
Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/27635 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Language: | English |
Similar Items
-
Application of excimer laser annealing in the formation of ultra-shallow p+/n junctions
by: Chong, Y.F., et al.
Published: (2014) -
Pulsed laser annealing of ultra-shallow junctions in silicon-germanium
by: Tan, L.S., et al.
Published: (2014) -
Defect Engineering in the formation of Ultra-shallow junctions for advanced nano-metal-oxide-semiconductor technology
by: YEONG SAI HOOI
Published: (2011) -
Formation of Ultra-Shallow Junctions in Silicon- Germanium by Pulsed Laser Annealing
by: ABIDHA BEGUM
Published: (2010) -
Laser thermal processing of amorphous silicon gates to reduce poly-depletion in CMOS devices
by: Chong, Y.F., et al.
Published: (2014)