Enhancement of adhesion strength of Cu layer on single and multi-layer dielectric film stack in Cu/low k multi-level interconnects
10.1016/j.mee.2004.05.003
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Main Authors: | Balakumar, S., Wong, G., Tsang, C.F., Hara, T., Yoo, W.J. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/55891 |
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Institution: | National University of Singapore |
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