Enhancement of adhesion strength of Cu layer on single and multi-layer dielectric film stack in Cu/low k multi-level interconnects

10.1016/j.mee.2004.05.003

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Bibliographic Details
Main Authors: Balakumar, S., Wong, G., Tsang, C.F., Hara, T., Yoo, W.J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55891
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Institution: National University of Singapore

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