Study of quasi-breakdown mechanism in ultra-thin gate oxide by using DCIV technique
Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA
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Main Authors: | Guan, Hao, Cho, Byung Jin, Li, M.F., He, Y.D., Xu, Zhen, Dong, Zhong |
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Other Authors: | ELECTRICAL ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/72949 |
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Institution: | National University of Singapore |
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