Investigation of hole-tunneling current through ultrathin oxynitride/oxide stack gate dielectrics in p-MOSFETs
10.1109/TED.2002.1013271
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Main Authors: | Yu, H., Hou, Y.-T., Li, M.-F., Kwong, D.-L. |
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Other Authors: | ELECTRICAL ENGINEERING |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/80633 |
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Institution: | National University of Singapore |
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