Patterning of burnishing head using SU-8 hard mask fabricated by deep X-ray lithography

Patterning of burnishing head using SU-8 hard mask fabricated by deep X-ray lithography

This paper studies on the application of X-ray irradiation from synchrotron light for burnishing head patterning. Feasibility study of SU-8 negative photoresist for AlTiC hard mask in reactive ion etching in CF 4 plasma is investigated and compared with chromium and AZ photoresist. X-ray lithography...

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書目詳細資料
Main Authors:	Maneekat Ch., Phatthanakun R., Siangchaew K., Leksakul K.
格式:	Conference or Workshop Item
語言:	English
出版:	2014
在線閱讀:	http://www.scopus.com/inward/record.url?eid=2-s2.0-84866759299&partnerID=40&md5=98013874e499ab3b3666d74b223a25a8 http://cmuir.cmu.ac.th/handle/6653943832/1607
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!
機構:	Chiang Mai University
語言:	English

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