Development of procedures for programmable proximity aperture lithography
Programmable proximity aperture lithography (PPAL) with MeV ions has been used in Jyväskylä and Chiang Mai universities for a number of years. Here we describe a number of innovations and procedures that have been incorporated into the LabView-based software. The basic operation involves the coordin...
Saved in:
Main Authors: | H. J. Whitlow, S. Gorelick, N. Puttaraksa, M. Napari, M. J. Hokkanen, R. Norarat |
---|---|
Format: | Journal |
Published: |
2018
|
Online Access: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84879082989&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/48105 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Chiang Mai University |
Similar Items
-
Development of procedures for programmable proximity aperture lithography
by: H. J. Whitlow, et al.
Published: (2018) -
Development of procedures for programmable proximity aperture lithography
by: Whitlow H.J., et al.
Published: (2014) -
Programmable proximity aperture lithography with MeV ion beams
by: Puttaraksa N., et al.
Published: (2014) -
Programmable proximity aperture lithography with MeV ion beams
by: Nitipon Puttaraksa, et al.
Published: (2018) -
Fabrication of microfluidic devices using MeV ion beam Programmable Proximity Aperture Lithography (PPAL)
by: S. Gorelick, et al.
Published: (2018)