Fabrication of multi-level photoresist patterns in one-step lithography by using Cr/Ni multi-film thickness mask

Fabrication of multi-level photoresist patterns in one-step lithography by using Cr/Ni multi-film thickness mask

The 3-D microstructure can be formed by using Multi-film thickness mask (MFT-mask) with single exposure and single develop. The intensity of the UV light getting through the mask increases as the thickness of the chromium film decreases. However, the ultra-thin Cr film makes the deposition and etchi...

Saved in:

書目詳細資料
Main Authors:	Narongchai Siwarakrangsun, Nithi Atthi, Supanit Porntheeraphat, Jirawat Jantawong, Komgrit Leksakul, Amporn Poyai
格式:	Book Series
出版:	2018
主題:	Engineering
在線閱讀:	https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84874043393&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/52570
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

相似書籍

Fabrication of multi-level photoresist patterns in one-step lithography by using Cr/Ni multi-film thickness mask
由: Narongchai Siwarakrangsun, et al.
出版: (2018)

In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithography
由: Tay, A., et al.
出版: (2014)

Study of the mask-less lithography system and its optimization for high resolution pattern of positive photoresist
由: Lu, Xiya
出版: (2024)

Study of the mask-less lithography system and its optimization for high resolution pattern of negative photoresist
由: Yuan, Chenjie
出版: (2024)

Lithography in UV photoresist using NSOM
由: Lin, Y., et al.
出版: (2014)

In-situ measurement and control of photoresist processing in lithography
由: HU NI
出版: (2010)

In-situ monitoring of photoresist thickness contour
由: Ho, W.K., et al.
出版: (2014)

Control of Photoresist Thickness Uniformity in the Microlithography Process
由: Tay, A.
出版: (2014)

Control of semiconductor substrate temperature uniformity during photoresist processing in lithography
由: Tay, A., et al.
出版: (2014)

Etching control of benzocyclobutene in CF4 / O2 and SF6 / O2 plasmas with thick photoresist and titanium masks
由: Liao, E.B., et al.
出版: (2014)

Formation of micromoulds via UV lithography of SU8 photoresist and nickel electrodeposition
由: Thian, S., et al.
出版: (2014)

In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence
由: Wu, X., et al.
出版: (2014)

Real-time monitoring of photoresist thickness contour in microlithography
由: Ho, W.K., et al.
出版: (2014)

Control of photoresist film thickness: Iterative feedback tuning approach
由: Tay, A., et al.
出版: (2014)

Patterning of burnishing head for hard disk platters by synchrotron radiation lithography
由: Komgrit Leksakul, et al.
出版: (2018)

Patterning of burnishing head for hard disk platters by synchrotron radiation lithography
由: Komgrit Leksakul, et al.
出版: (2018)

Patterning of burnishing head using SU-8 hard mask fabricated by deep X-ray lithography
由: Maneekat Ch., et al.
出版: (2014)

Patterning of burnishing head using SU-8 hard mask fabricated by deep X-ray lithography
由: Ch Maneekat, et al.
出版: (2018)

Optimization and application of Epon SU-8, an ultra-thick negative photoresist
由: Tan, Khee Lip.
出版: (2008)

Influence of wafer warpage on photoresist film thickness and extinction coefficient measurements
由: Wu, X., et al.
出版: (2014)

Critical dimension uniformity via real-time photoresist thickness control
由: Ho, W.K., et al.
出版: (2014)

Real-time control of photoresist thickness uniformity during the bake process
由: Lay, Lee Lay, et al.
出版: (2014)

Improving mechanical properties of Co-Cr-W alloys by powder metallurgy
由: Choncharoen Sawangrat, et al.
出版: (2018)

Improving mechanical properties of Co-Cr-W alloys by powder metallurgy
由: Choncharoen Sawangrat, et al.
出版: (2018)

A thick photoresist process for advanced wafer level packaging applications using JSR THB-151N negative tone UV photoresist
由: Rao, V.S., et al.
出版: (2014)

Iterative feedback tuning of optical proximity correction mask in lithography
由: Qu, Y., et al.
出版: (2014)

Integrated process of photoresist trimming and dielectric hard mask etching for sub-50 nm gate patterning
由: Bliznetsov, V., et al.
出版: (2014)

Submicrometer lithography of a silicon substrate by machining of photoresist using atomic force microscopy followed by wet chemical etching
由: Li, S.F.Y., et al.
出版: (2014)

Fabrication of multi-functional nanofiber mask
由: Chua, Rachel Yi Xuan
出版: (2022)

Application of phase shift masking to sub-micron contact level lithography
由: Choo, Lay Cheng.
出版: (2008)

Application of phase shift masking to sub-0.13 micron lithography
由: Koo, Chee Kiong.
出版: (2008)

NANOFABRICATION USING OPTIMIZED PROTON BEAM WRITING AND MASKED ION LITHOGRAPHY
由: SARFRAZ QURESHI
出版: (2019)

Process window optimization of CPL mask for beyond 45nm lithography
由: Tan, S.Y., et al.
出版: (2014)

Artificial Bee Colony for Solving Multi-Objectives Three-Dimensional Knapsack Problem
由: Suriya Phongmoo, et al.
出版: (2020)

Monitoring and control of photoresist properties and CD during photoresist processing
由: Yang, G., et al.
出版: (2014)

Monitoring and control of photoresist properties and CD during photoresist processing
由: Yang, G., et al.
出版: (2014)

Micro-rapid-prototyping via multi-layered photo-lithography
由: Thian, S.C.H., et al.
出版: (2014)

X-ray lithography of SU8 photoresist using fast miniature plasma focus device and its characterization using FTIR spectroscopy
由: Kalaiselvi, Shenbaga M. P., et al.
出版: (2016)

Fabrication of electrostatic MEMS microactuator based on X-ray lithography with Pb-based X-ray mask and dry-film-transfer-to-PCB process
由: Kerdlapee,P., et al.
出版: (2015)

The Characterization of Chromeless Phase Shift Mask Technique for Sub-45nm Lithography
由: TAN SOON YOENG
出版: (2010)