Lithography exposure characteristics of poly(methyl methacrylate) (PMMA) for carbon, helium and hydrogen ions
Poly(methyl methacrylate) is a common polymer used as a lithographic resist for all forms of particle (photon, ion and electron) beam writing. Faithful lithographic reproduction requires that the exposure dose, Θ, lies in the window Θ0 ≤ Θ < Θ×0, where Θ0 and Θ×0 represent the clearing and cr...
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| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
2014
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| Online Access: | http://www.scopus.com/inward/record.url?eid=2-s2.0-79951960125&partnerID=40&md5=28b6b6135971046c81edcd3cd26d35fd http://cmuir.cmu.ac.th/handle/6653943832/6856 |
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| Institution: | Chiang Mai University |
| Language: | English |