Large Q-Factor Improvement for Spiral Inductors on Silicon Using Proton Implantation

by Chan, K.T., Huang, C.H., Chin, A., Li, M.F., Kwong, D.-L., McAlister, S.P., Duh, D.S., Lin, W.J.
Published 2014

Work function tuning of metal nitride electrodes for advanced CMOS devices

by Ren, C., Faizhal, B.B., Chan, D.S.H., Li, M.-F., Yeo, Y.-C., Trigg, A.D., Balasubramanian, N., Kwong, D.-L.
Published 2014

A silicon platform with MEMS active alignment function and its potential application in Si-photonics packaging

by Zhang, Q.X., Du, Y., Tan, C.W., Zhang, J., Yu, M.B., Yeoh, W.G., Lo, G.-Q., Kwong, D.-L.
Published 2014

Development of flexible neural probes using SU-8/parylene

by Xiang, Z., Wang, H., Zhang, S., Yen, S.-C., Je, M., Tsang, W.M., Xu, Y.-P., Thakor, N.V., Kwong, D.-L., Lee, C.
Published 2014

Very Low Defects and High Performance Ge-On-insulator p-MOSFETs with Al2O3 Gate Dielectrics

by Huang, C.H., Yang, M.Y., Chin, A., Chen, W.J., Zhu, C.X., Cho, B.J., Li, M.-F., Kwong, D.L.
Published 2014

Frequency dependent dynamic charge trapping in HfO 2 and threshold voltage instability in MOSFETs

by Shen, C., Yu, H.Y., Wang, X.P., Li, M.-F., Yeo, Y.-C., Chan, D.S.H., Bera, K.L., Kwong, D.L.
Published 2014

Laminated metal gate electrode with tunable work function for advanced CMOS

by Bae, S.H., Bai, W.P., Wen, H.C., Mathew, S., Bera, L.K., Balasubramanian, N., Yamada, N., Li, M.F., Kwong, D.L.
Published 2014

MIM capacitors with HfO2 and HfAlOx for Si RF and analog applications

by Yu, X., Zhu, C., Hu, H., Chin, A., Li, M.F., Cho, B.J., Kwong, D.-L., Foo, P.D., Yu, M.B.
Published 2014

A novel program-erasable high-κ AlN capacitor with memory function

by Chin, A., Lai, C.H., Hung, B.F., Cheng, C.F., McAlister, S.P., Zhu, C., Li, M.-F., Kwong, D.-L.
Published 2014

Formation of hafnium-aluminum-oxide gate dielectric using single cocktail liquid source in MOCVD process

by Joo, M.S., Cho, B.J., Yeo, C.C., Chan, D.S.H., Whoang, S.J., Mathew, S., Bera, L.K., Balasubramanian, N., Kwong, D.-L.
Published 2014

Self assembled ZnO hollow spheres and hexagonal stacking disks by metal-organic chemical-vapour deposition

by Tan, S.T., Sun, X.W., Zhang, X.H., Chua, S.J., Chow, S.Y., Yong, A.M., Lo, G.Q., Kwong, D.L.
Published 2014

A high-density MIM capacitor (13 fF/μm2) using ALD HfO2 dielectrics

by Yu, X., Zhu, C., Hu, H., Chin, A., Li, M.F., Cho, B.J., Kwong, D.-L., Foo, P.D., Yu, M.B.
Published 2014

Fast Vth instability in HfO2 gate dielectric MOSFETs and Its impact on digital circuits

by Shen, C., Yang, T., Li, M.-F., Samudra, G., Yeo, Y.-C., Zhu, C.X., Rustagi, S.C., Yut, M.B., Kwong, D.-L.
Published 2014

Yttrium- and terbium-based interlayer on SiO2 and HfO2 gate dielectrics for work function modulation of nickel fully silicided gate in nMOSFET

by Lim, A.E.-J., Lee, R.T.P., Wang, X.P., Hwang, W.S., Tung, C.H., Samudra, G.S., Kwong, D.-L., Yeo, Y.-C.
Published 2014

Three-layer laminated metal gate electrodes with tunable work functions for CMOS applications

by Bai, W.P., Bae, S.H., Wen, H.C., Mathew, S., Bera, L.K., Balasubramanian, N., Yamada, N., Li, M.F., Kwong, D.-L.
Published 2014

SiGe on insulator MOSFET integrated with Schottky source/drain and HfO 2/TaN gate stack

by Gao, F., Lee, S.J., Rui, L., Wang, S.J., Cho, B.J., Balakumar, S., Tung, C.-H., Chi, D.Z., Kwong, D.L.
Published 2014

Nonvolatile flash memory device using Ge nanocrystals embedded in HfAlO High-κ tunneling and control oxides: Device fabrication and electrical performance

by Chen, J.H., Wang, Y.Q., Yoo, W.J., Yeo, Y.-C., Samudra, G., Chan, D.S.H., Du, A.Y., Kwong, D.-L.
Published 2014

Improvement of voltage linearity in high-κ MIM capacitors using HfO2-SiO2 stacked dielectric

by Kim, S.J., Cho, B.J., Li, M.-F., Ding, S.-J., Zhu, C., Yu, M.B., Narayanan, B., Chin, A., Kwong, D.-L.
Published 2014

Effect of nickel silicide induced dopant segregation on vertical silicon nanowire diode performance

by Tan, Chuan Seng, Lu, W., Pey, K. L., Singh, N., Leong, K. C., Liu, Q., Gan, C. L., Lo, G. Q., Kwong, D. -L.
Published 2014

Effects of annealing and temperature on SGOI fabrication using Ge condensation

by Balakumar, S., Ong, C.S., Tung, C.H., Trigg, A., Li, M.F., Kumar, R., Lo, G.Q., Balasubramanian, N., Yeo, Y.C., Kwong, D.L.
Published 2014