A new method for enhancing high- k /metal-gate stack performance and reliability for high- k last integration

由 Yew, K. S., Tang, L. J., Ang, Diing Shenp
出版 2013

Substituted aluminum metal gate on high-K dielectric for low work-function and fermi-level pinning free

由 Park, C.S., Cho, B.J., Tang, L.J., Kwong, D.-L.
出版 2014

Impact of buried capping layer on TDDB physics of advanced interconnects

由 Yiang, K.Y., Yoo, W.J., Krishnamoorthy, A., Tang, L.J.
出版 2014

Self-assembly of Al2O3 nanodots on SiO2 using two-step controlled annealing technique for long retention nonvolatile memories

由 Chen, J.H., Yoo, W.J., Chan, D.S.H., Tang, L.-J.
出版 2014

Surface passivation using ultrathin AlN x film for Ge-metal-oxide-semiconductor devices with hafnium oxide gate dielectric

由 Gao, F., Lee, S.J., Pan, J.S., Tang, L.J., Kwong, D.-L.
出版 2014

Improved electrical performance of Erbium silicide Schottky diodes formed by pre-RTA amorphization of Si

由 Tang, L. J., Tan, Eu Jin, Pey, Kin Leong, Chi, Dong Zhi, Lee, Pooi See
出版 2012

Gate Dielectric-Breakdown-Induced Microstructural Damage in MOSFETs

由 Tang, L.J., Pey, K.L., Tung, C.H., Radhakrishnan, M.K., Lin, W.H.
出版 2014

Size difference in dielectric-breakdown-induced epitaxy in narrow n- and p-metal oxide semiconductor field effect transistors

由 Pey, K.L., Tung, C.H., Tang, L.J., Lin, W.H., Radhakrishnan, M.K.
出版 2014

Dual metal gate process by metal substitution of dopant-free polysilicon on high-K dielectric

由 Park, C.S., Cho, B.J., Hwang, W.S., Loh, W.Y., Tang, L.J., Kwong, D.-L.
出版 2014

Study of surface passivation of strained indium gallium arsenide by vacuum annealing and silane treatment

由 Chin, H.-C., Wang, B., Lim, P.-C., Tang, L.-J., Tung, C.-H., Yeo, Y.-C.
出版 2014

Gate dielectric degradation mechanism associated with DBIE evolution

由 Pey, K.L., Ranjan, R., Tung, C.H., Tang, L.J., Lin, W.H., Radhakrishnan, M.K.
出版 2014

Geometry dependence of gate oxide breakdown evolution

由 Sun, Y., Pey, K.L., Tung, C.H., Lombardo, S., Palumbo, F., Tang, L.J., Radhakrishnan, M.K.
出版 2014

Structural analysis of breakdown in ultrathin gate dielectrics using transmission electron microscopy

由 Pey, K.L., Tung, C.H., Tang, L.J., Ranjan, R., Radhakrishnan, M.K., Lin, W.H., Lombardo, S., Palumbo, F.
出版 2014

Correlation between optical properties and Si nanocrystal formation of Si-rich Si oxide films prepared by plasma-enhanced chemical vapor deposition

由 Chen, X.Y., Lu, Y.F., Wu, Y.H., Cho, B.J., Tang, L.J., Lu, D., Dong, J.R.
出版 2014

Correlation of failure mechanism of constant-current-stress and constant-voltage-stress breakdowns in ultrathin gate oxides of nMOSFETs by TEM

由 Pey, K.L., Tung, C.H., Radhakrishnan, M.K., Tang, L.J., Sun, Y., Wang, X.D., Lin, W.H.
出版 2014

Structure of the breakdown spot during progressive breakdown of ultra-thin gate oxides

由 Palumbo, F., Lombardo, S., Pey, K.L., Tang, L.J., Tung, C.H., Lin, W.H., Radhakrishnan, M.K., Falci, G.
出版 2014

Pulsed laser induced silicidation on TiN-capped Co/Si bilayers

由 Chow, F. L., Lee, Pooi See, Pey, Kin Leong, Tang, L. J., Tung, Chih Hang, Wang, X. C., Lim, G. C.
出版 2012

Multiple-pulse laser thermal annealing for the formation of Co-silicided junction

由 Lee, Pooi See, Pey, Kin Leong, Chow, F. L., Tang, L. J., Tung, Chih Hang, Wang, X. C., Lim, G. C.
出版 2012

Germanium p- & n-MOSFETs fabricated with novel surface passivation (plasma-PH 3 and thin AlN) and TaN/HfO 2 gate stack

由 Whang, S.J., Lee, S.J., Gao, F., Wu, N., Zhu, C.X., Pan, J.S., Tang, L.J., Kwong, D.L.
出版 2014

A new breakdown failure mechanism in HfO 2 gate dielectric

由 Ranjan, R., Pey, K.L., Tang, L.J., Tung, C.H., Groeseneken, G., Radhakrishnan, M.K., Kaczer, B., Degraeve, R., De Gendt, S.
出版 2014