Study of the effect of forward gate bias stress on the reliability of AlGaN/GaN HEMTs on SI

AlGaN/GaN high electron mobility transistors (HEMTs) have shown promising capabilities for high frequency and high-power applications. As 5G technology and autonomous vehicles become more and more attractive, HEMTs will start to play an increasingly important role in the semiconductor industry. Whil...

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Bibliographic Details
Main Author: Gao, Yu
Other Authors: Gan Chee Lip
Format: Thesis-Doctor of Philosophy
Language:English
Published: Nanyang Technological University 2021
Subjects:
Online Access:https://hdl.handle.net/10356/152654
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Institution: Nanyang Technological University
Language: English

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