Study of plasma etching of silicon carbide

Etching is a very crucial process in the fabrication of SiC microelectronic devices. Due to its exceptional chemical inertness, plasma etching is the only practical means of etching SiC. With more stringent requirements placed on the etch rate, etching profiles, surface quality for advanced SiC devi...

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Bibliographic Details
Main Author: Xia, Jinghua
Other Authors: Rusli
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
Online Access:https://hdl.handle.net/10356/42362
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Institution: Nanyang Technological University
Language: English

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