Development of a novel filtered cathodic vacuum arc deposition system for carbon metal nanocluster thin films

Carbon metal nanocluster (C:Me) films have been used to protect the metal nanoclusters from oxidation and enhance its properties, in the same time the incorporation of metal nanoclusters within the carbon thin film is also able to reduce the high compressive stress of the carbon film, improve its me...

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Bibliographic Details
Main Author: Xu, Naiyun
Other Authors: Tay Beng Kang
Format: Theses and Dissertations
Language:English
Published: 2014
Subjects:
Online Access:https://hdl.handle.net/10356/61041
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Institution: Nanyang Technological University
Language: English

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