Short-channel drain current model for asymmetric heavily / lightly doped DG MOSFETs
The paper presents a drain current model for double gate metal oxide semiconductor field effect transistors (DG MOSFETs) based on a new velocity saturation model that accounts for short-channel velocity saturation effect independently in the front and the back gate controlled channels under asymmetr...
Saved in:
Main Authors: | Dutta, Pradipta, Syamal, Binit, Koley, Kalyan, Dutta, Arka, Sarkar, C. K. |
---|---|
Other Authors: | School of Electrical and Electronic Engineering |
Format: | Article |
Language: | English |
Published: |
2018
|
Subjects: | |
Online Access: | https://hdl.handle.net/10356/89322 http://hdl.handle.net/10220/44866 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Language: | English |
Similar Items
-
A New Threshold Voltage and Drain Current Model for Lightly/Heavily Doped Surrounding Gate MOSFETs
by: Dutta, Pradipta, et al.
Published: (2016) -
Subthreshold analog/RF performance of underlap DG FETs with asymmetric source/drain extensions
by: Koley, Kalyan, et al.
Published: (2013) -
EXPERIMENTAL STUDY OF HIGH GATE TO DRAIN LEAKAGE CURRENT IN 0.18μm CMOS TECHNOLOGY
by: CHANDRASEKAR VENKATARAMANI
Published: (2019) -
Interface barrier abruptness and work function requirements for scaling Schottky source-drain MOS transistors
by: Agrawal, N., et al.
Published: (2014) -
A novel experimental technique for the lateral profiling of oxide and interface state charges in hot-hole degraded N-MOSFET's
by: Ang, D.S., et al.
Published: (2014)