High-frequency microwave noise characteristics of InAlN/GaN high-electron mobility transistors on Si (111) substrate
We report for the first time high-frequency microwave noise performance on 0.17-μm T-gate In0.17Al0.83N/GaN high-electron mobility transistors (HEMTs) fabricated on Si(111). The HEMTs exhibited a maximum drain current density of 1320 mA/mm, a maximum extrinsic transconductance of 363 mS/mm, an unity...
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Main Authors: | Arulkumaran, Subramaniam, Ranjan, K., Ng, G. I., Manoj Kumar, C. M., Vicknesh, S., Dolmanan, S. B., Tripathy, S. |
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Other Authors: | Temasek Laboratories |
Format: | Article |
Language: | English |
Published: |
2015
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/98599 http://hdl.handle.net/10220/25657 |
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Institution: | Nanyang Technological University |
Language: | English |
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