Failure mechanism analysis and process improvement on time-dependent dielectric breakdown of Cu/ultra-low-k dielectric based on complementary Raman and FTIR spectroscopy study
10.1063/1.4890960
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| Main Authors: | , , , , , |
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| Other Authors: | |
| Format: | Article |
| Published: |
2020
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| Subjects: | |
| Online Access: | https://scholarbank.nus.edu.sg/handle/10635/183712 |
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| Institution: | National University of Singapore |