Native point defects in yttria and relevance to its use as a high-dielectric-constant gate oxide material: First-principles study
10.1103/PhysRevB.73.104101
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Main Authors: | Zheng, J.X., Ceder, G., Maxisch, T., Chim, W.K., Choi, W.K. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/56769 |
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Institution: | National University of Singapore |
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