Influence of thickness on nanomechanical behavior of Black Diamond™ low dielectric thin films for interconnect and packaging applications
10.1007/s10854-008-9610-8
Saved in:
Main Authors: | Sekhar, V.N., Chai, T.C., Balakumar, S., Shen, Lu., Sinha, S.K., Tay, A.A.O., Yoon, S.W. |
---|---|
Other Authors: | MECHANICAL ENGINEERING |
Format: | Article |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/60540 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Investigation of mechanical properties of black diamond™ (low-K) thin films for Cu/low-k interconnect applications
by: Sekhar, V.N., et al.
Published: (2014) -
Bed of nails: Fine pitch wafer-level packaging interconnects for high performance nano devices
by: Rao, V.S., et al.
Published: (2014) -
New paradigm in IC-package interconnections by reworkable nano-interconnects
by: Aggarwal, A.O., et al.
Published: (2014) -
Mechanical behavior of Cu/low-k stacks with different barrier layers
by: Sekhar, V.N., et al.
Published: (2014) -
Optimization of reliability of copper column flip chip packages with variable compliance interconnects
by: Tay, A.A.O., et al.
Published: (2014)