SILICON NITRIDE FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL VAPOUR DEPOSITION (PECVD) OF SiH//4/NH//3/N//2 MIXTURES: SOME PHYSICAL PROPERTIES.

SILICON NITRIDE FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL VAPOUR DEPOSITION (PECVD) OF SiH//4/NH//3/N//2 MIXTURES: SOME PHYSICAL PROPERTIES.

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

Saved in:

書目詳細資料
Main Authors:	Ling, C.H., Kwok, C.Y., Prasad, K.
其他作者:	ELECTRICAL ENGINEERING
格式:	Article
出版:	2014
在線閱讀:	http://scholarbank.nus.edu.sg/handle/10635/62763
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

相似書籍

Crystalline carbon nitride deposition by r.f.-PECVD using a C2H4-NH3-H2 source gas mixture
由: Lim, S.F., et al.
出版: (2014)

Structural and optical properties of a-Si:H/nc-Si:H thin films grown from Ar-H2-SiH4 mixture by plasma-enhanced chemical vapor deposition
由: Wang, Y.H., et al.
出版: (2014)

INDUSTRIAL DEPOSITION OF SILICON NITRIDE ON MC-SI FOR SOLAR CELL PRODUCTION EMPLOYING MICROWAVE PECVD
由: WU RUIHONG
出版: (2019)

Structural study of plasma enhanced chemical vapour deposited silicon carbide films
由: Choi, W.K., et al.
出版: (2014)

RELATIVE HYDROGEN CONTENT IN PLASMA-ENHANCED CVD SILICON NITRIDE FILMS: SUBSTRATE TEMPERATURE DEPENDENCE AND EFFECT OF THERMAL ANNEALING.
由: Ling, C.H., et al.
出版: (2014)

Impact of deposition parameters on the material quality of SPC poly-Si thin films using high-rate PECVD of a-Si:H
由: Kumar, A, et al.
出版: (2020)

Integrated approach for low-temperature synthesis of high-quality silicon nitride films in PECVD using RF-UHF hybrid plasmas
由: B. B. Sahu, et al.
出版: (2018)

Integrated approach for low-temperature synthesis of high-quality silicon nitride films in PECVD using RF-UHF hybrid plasmas
由: Sahu B., et al.
出版: (2017)

EFFECT OF OXYGEN INCORPORATION OF BHF ETCH RATE OF PLASMA-ENHANCED CVD SILICON NITRIDE FILMS PREPARED IN THE TEMPERATURE RANGE 50-300 degree C.
由: Ling, C.H., et al.
出版: (2014)

OPTICAL AND OXIDATION STUDIES OF PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITED AMORPHOUS SILICON CARBIDE FILMS
由: SHIBU GANGADHARAN
出版: (2019)

OPTICAL AND OXIDATION STUDIES OF PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITED AMORPHOUS SILICON CARBIDE FILMS
由: SHIBU GANGADHARAN
出版: (2019)

Silicon nanostructures fabricated by Au and SiH4 co-deposition technique using hot-wire chemical vapor deposition
由: Chong, S.K., et al.
出版: (2014)

Evaluation of PECVD deposited boron nitride as copper diffusion barrier on porous low-k materials
由: Liu, J., et al.
出版: (2014)

FABRIKASI FOTORESEPTOR BERBASIS LAPISAN IPIS A-SI:H DAN PADUANNYA DENGAN REAKTOR PECVD GANDA
由: Kade Suardana, I

Kinetic study of solid phase crystallisation of expanding thermal plasma deposited a-Si:H
由: Law, F., et al.
出版: (2014)

Doped microcrystalline silicon layers for solar cells by 13.56 MHz plasma-enhanced chemical vapour deposition
由: Long, J., et al.
出版: (2014)

High-quality surface passivation of low-resistivity p-type C-Si by hydrogenated amorphous silicon nitride deposited by industrial-scale microwave PECVD
由: Dutta Gupta, S., et al.
出版: (2014)

Diffusion and oxidation of plasma-enhanced chemical-vapor-deposition silicon nitride and underlying metals
由: Han, G.C., et al.
出版: (2014)

CHARACTERIZATION OF PECVD DOUBLE-CHAMBER FOR FABRICATION OF DELTA-DOPED P-I-N A-SI:H SOLAR CELLS
由: S. (NIM 20296511), Amiruddin

Suppression of interfacial voids formation during silane (SiH4)-based silicon oxide bonding with a thin silicon nitride capping layer
由: Lee, Kwang Hong, et al.
出版: (2019)

Diamond film growth by microwave plasma enhanced chemical vapour deposition
由: Tan, Fong Hock.
出版: (2009)

PENUMBUHAN LAPISAN TIPIS A-SI:H DENGAN METODA HW-PECVD DAN APLIKASINYA PADA TRANSISTOR LAPISAN TIPIS
由: Ahda, Syahfandi

SYNTHESIS AND CHARACTERIZATION OF RF-PECVD CARBON NITRIDE THIN FILMS
由: LIM SHUANG FANG
出版: (2019)

SYNTHESIS AND CHARACTERIZATION OF RF-PECVD CARBON NITRIDE THIN FILMS
由: LIM SHUANG FANG
出版: (2019)

Deposisi dan karakterisasi lapisan tipis a-Si:H (Deposition and characterization of a-Si:H thin films)
由: , ANAS, Muhammad, et al.
出版: (1995)

In-situ X-ray diffraction analysis of the crystallisation of a-SI:H films deposited by the expanding thermal plasma technique
由: Law, F., et al.
出版: (2014)

Simulation and characterization of the inductive-coupled plasma chemical vapour deposition of nano-sized materials
由: Asutosh Srivastava.
出版: (2008)

Investigation on oxide growth mechanism of PECVD silicon carbide films
由: Choi, W.K., et al.
出版: (2014)

Process analysis and optimization on PECVD amorphous silicon on glass substrate
由: Ong, Y.Y., et al.
出版: (2014)

STUDY OF SILICON NANOWIRE GROWTH ON Ag CATALYST USING HWC-IN PLASMA-VHF-PECVD THROUGH PRESSURE OPTIMIZATION
由: ANGGORO (NIM : 20210301); Pembimbing Prof. Toto Winata, Ph.D, DIKY

The augmented saddle field discharge characteristics and its applications for plasma enhanced chemical vapour deposition
由: Wong, J., et al.
出版: (2016)

Investigation of Wide Process Temperature Window for Amorphous Silicon Suboxide Thin-Film Passivation Deposited by Inductively Coupled PECVD
由: Ge, Jia, et al.
出版: (2016)

Negative bias temperature instability on plasma-nitrided silicon dioxide film
由: Ang, C.-H., et al.
出版: (2014)

Negative bias temperature instability on plasma-nitrided silicon dioxide film
由: Ang, C.-H., et al.
出版: (2014)

Diffusion barrier properties of ionized metal plasma deposited tantalum nitride thin films between copper and silicon dioxide
由: Latt, K.M., et al.
出版: (2014)

Effect of Hydrogen Dilution to The Result of Silicon Nanowire Growth Grown by HWC-in Plasma-VHF-PECVD on a Silver Catalyst
由: MARDIAN KARTIWA (NIM : 10208070); Pembimbing : Prof. Toto Winata, Ph.D , GILANG

MODEL FOR PREDICTING THE EFFECT OF DISSOLVED SALT ON THE VAPOUR LIQUID EQUILIBRIUM OF SOLVENT MIXTURES.
由: Tan, T.C.
出版: (2014)

ICP etching of RF sputtered and PECVD silicon carbide films
由: Shi, J., et al.
出版: (2014)

THE USE OF PECVD SILICON OXYNITRIDE THIN-FILMS IN MICROELECTRONICS MANUFACTURING
由: XU MIN
出版: (2019)

Synthesis of boron doped continuous diamond film by microwave assisted plasma enhanced chemical vapour deposition
由: Wang, Shancheng
出版: (2016)