Effects of RF power and annealing on the electrical and structural properties of sputtered amorphous silicon carbide films

10.1016/S0921-5107(99)00486-9

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Bibliographic Details
Main Authors: Choi, W.K., Chong, N.B., Tan, L.S., Han, L.J.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/80379
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Institution: National University of Singapore

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