Two types of local oxide/substrate defects in very thin silicon dioxide films on silicon
10.1063/1.114807
Saved in:
Main Authors: | Lau, W.S., Sane, V., Pey, K.S., Cronquist, B. |
---|---|
Other Authors: | ELECTRICAL ENGINEERING |
Format: | Article |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/81314 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
New type of local defects in very thin silicon dioxide films on arsenic-implanted p-type silicon
by: Lau, W.S., et al.
Published: (2014) -
Quantitative imaging of local defects in very thin silicon dioxide films at low bias voltage by true oxide electron-beam-induced current
by: Lau, W.S., et al.
Published: (2014) -
Quantitative imaging of local defects in very thin silicon dioxide films at low bias voltage by true oxide electron-beam-induced current
by: Lau, W.S., et al.
Published: (2014) -
True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films
by: Lau, W.S., et al.
Published: (2014) -
True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films
by: Lau, W.S., et al.
Published: (2014)