High-energy tail electrons as the mechanism for the worst-case hot-carrier stress degradation of the deep submicrometer N-MOSFET
10.1109/LED.2003.814011
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Main Authors: | Ang, D.S., Phua, T.W.H., Liao, H., Ling, C.H. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Others |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/84411 |
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Institution: | National University of Singapore |
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