The role of a tensile stress bias for a sensitive silicon mechanical stress sensor based on a change in gate-induced-drain leakage current
Mechanical stress sensors based on silicon piezoresistance have limited sensitivity. Mechanical stress sensors based on the on-current or off-current or threshold voltage of silicon MOS transistors also have limited sensitivity. In this paper, we report that the sensitivity of a silicon-based mechan...
Saved in:
Main Authors: | Lau, W. S., Yang, Peizhen., Siah, S. Y., Chan, L. |
---|---|
Other Authors: | School of Electrical and Electronic Engineering |
Format: | Article |
Language: | English |
Published: |
2013
|
Subjects: | |
Online Access: | https://hdl.handle.net/10356/102542 http://hdl.handle.net/10220/11296 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Language: | English |
Similar Items
-
Stress-induced leakage current in ultra-thin gate oxide
by: Ang, Kheng Guan
Published: (2008) -
Gate-induced drain leakage current enhanced by plasma charging damage
by: Ma, S., et al.
Published: (2014) -
Stress-induced leakage current in dual-gate CMOSFETS with thin nitrided gate oxides
by: HUANG JINSHENG
Published: (2010) -
Comparative study of radiation- and stress-induced leakage currents in thin gate oxides
by: Ang, C.H., et al.
Published: (2014) -
Enhanced strain effects in 25-nm gate-length thin-body nMOSFETs with silicon-carbon source/drain and tensile-stress liner
by: Ang, K.-W., et al.
Published: (2014)