2DEG enhancement via epilayer stress engineering in AlN/GaN/AlN heterostructure
Over the last couple of decades, GaN-based materials have emerged as promising candidates for high power and high-frequency devices. This can be attributed to their unique and attractive properties such as wide range of bandgap, high saturation velocity, spontaneous and piezoelectric polarization, a...
Saved in:
Main Author: | Patwal, Shashank |
---|---|
Other Authors: | Radhakrishnan K |
Format: | Thesis-Doctor of Philosophy |
Language: | English |
Published: |
Nanyang Technological University
2021
|
Subjects: | |
Online Access: | https://hdl.handle.net/10356/153068 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Language: | English |
Similar Items
-
Investigation of interface properties of h-BN and AlN on AlGaN/GaN heterostructures
by: Whiteside, Matthew David
Published: (2021) -
A study on Ga – Si interdiffusion during (Al)GaN/AlN growth on Si by plasma assisted molecular beam epitaxy
by: Zheng, Y., et al.
Published: (2020) -
Deposition, characterization, and device fabrication of GaN and AlN based thin film materials
by: Ashraf Uddin.
Published: (2008) -
AlN-AlN wafer bonding and its thermal characteristics
by: Bao, Shunyu, et al.
Published: (2015) -
High vertical breakdown strength in with low specific on-resistance AlGaN/AlN/GaN HEMTs on silicon
by: Vicknesh, S., et al.
Published: (2014)