Copper micro and nano particles mixture for 3D interconnection application
Copper is a well-known material used for interconnections application. It offers economical advantage over silver and has high electrical conductivity. Studies on copper nano-paste (comprising of monodispersed nano-particles) application on surfaces have reported cracking and a low packing densit...
Saved in:
主要作者: | Dai, Yuan-Yuan |
---|---|
其他作者: | Tan Chuan Seng |
格式: | Theses and Dissertations |
語言: | English |
出版: |
2016
|
主題: | |
在線閱讀: | http://hdl.handle.net/10356/67807 |
標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|
機構: | Nanyang Technological University |
語言: | English |
相似書籍
-
Application of carbon nanotubes (CNTS) in copper/low k interconnects design
由: Loo, Shane Zhi Yuan
出版: (2010) -
Electromigration reliability of copper interconnect in submicron microelectronics application
由: Ang, Kian Ann
出版: (2008) -
Effect of stress migration on electromigration for nano scale advanced interconnects
由: Anson Heryanto
出版: (2012) -
Vertical-SI-nanowire based nonvolatile flash memory for 3-D ultrahigh density application
由: Sun, Yuan
出版: (2012) -
Reliability modeling for ULSI interconnects
由: Hou, Yue Jin
出版: (2010)