Hot-electron degradation in NMOSFET's: Results from temperature anneal
10.1109/16.293364
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Main Authors: | Ling, C.H., Ah, L.K., Choi, W.K., Tan, S.E., Ang, D.S. |
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Other Authors: | ELECTRICAL ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/80548 |
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Institution: | National University of Singapore |
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