Enhancement of adhesion strength of Cu seed layer with different thickness in Cu/low-k multilevel interconnects
10.1116/1.1795251
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Main Authors: | Wang, G., Jong, Y.W., Balakumar, S., Seah, C.H., Hara, T. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/82291 |
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Institution: | National University of Singapore |
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