High-temperature stable HfLaON p-MOSFETs with high-work-function Ir 3Si gate
10.1109/LED.2007.892367
Saved in:
Main Authors: | Wu, C.H., Hung, B.F., Chin, A., Wang, S.J., Wang, X.P., Li, M.-F., Zhu, C., Yen, F.Y., Hou, Y.T., Jin, Y., Tao, H.J., Chen, S.C., Liang, M.S. |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
|
Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/82470 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
High temperature stable [Ir3Si-TaN]/HfLaON CMOS with large work-function difference
by: Wu, C.H., et al.
Published: (2014) -
Tuning effective metal gate work function by a novel gate dielectric HfLaO for nMOSFETs
by: Wang, X.P., et al.
Published: (2014) -
Low noise and high gain RF MOSFETs on plastic substrates
by: Kao, H.L., et al.
Published: (2014) -
Schottky-barrier S/D MOSFETs with high-K gate dielectrics and metal-gate electrode
by: Zhu, S., et al.
Published: (2014) -
Low Vt gate-first Al/TaN/[Ir3Si-HfSi 2-x]/HfLaON CMOS using simple laser annealing/reflection
by: Liao, C.C., et al.
Published: (2014)