Gate-all-around quantum-wire field-effect transistor with dopant segregation at metal-semiconductor-metal heterostucture

Gate-all-around quantum-wire field-effect transistor with dopant segregation at metal-semiconductor-metal heterostucture

Digest of Technical Papers - Symposium on VLSI Technology

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Bibliographic Details
Main Authors:	Wong, H.-S., Tan, L.-H., Chan, L., Lo, G.-Q., Samudra, G., Yeo, Y.-C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83756
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Institution:	National University of Singapore

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