Thickness effect on nickel silicide formation and thermal stability for ultra shallow junction CMOS

Materials Research Society Symposium - Proceedings

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Bibliographic Details
Main Authors: Zhao, F.F., Shen, Z.X., Zheng, J.Z., Gao, W.Z., Osipowicz, T., Pang, C.H., Lee, P.S., See, A.K.
Other Authors: PHYSICS
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/98936
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Institution: National University of Singapore

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