Deposition, characterization, and device fabrication of GaN and AlN based thin film materials

With the wide appealing application of GaN in electronic and optoelectronic device, many researchers had come out with innovative ways of preventing the cracks and reduction of strain at the interface. This is due to the different in CTE and approximately 16.9% lattice mismatch between GaN and Si su...

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Bibliographic Details
Main Author: Ashraf Uddin.
Other Authors: School of Materials Science & Engineering
Format: Research Report
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/5027
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Institution: Nanyang Technological University

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