Band alignment of HfAlO/GaN (0 0 0 1) determined by X-ray photoelectron spectroscopy: Effect of in situ SiH4 passivation

• Main Authors: Liu, X., Liu, Z., Pannirselvam, S., Pan, J., Liu, W., Jia, F., Lu, Y., Liu, C., Yu, W., He, J., Tan, L.S.
• Other Authors: DIVISION OF BIOENGINEERING
• Format: Article
• Published: Elsevier 2016
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/128133
• Institution: National University of Singapore

10.1016/j.jallcom.2015.02.139