AlGaN/GaN metal-oxide-semiconductor high-electron-mobility transistor with polarized P(VDF-TrFE) Ferroelectric polymer gating
10.1038/srep14092
Saved in:
Main Authors: | Liu X., Lu Y., Yu W., Wu J., He J., Tang D., Liu Z., Somasuntharam P., Zhu D., Liu W., Cao P., Han S., Chen S., Seow Tan L. |
---|---|
Other Authors: | ELECTRICAL AND COMPUTER ENGINEERING |
Format: | Article |
Published: |
Nature Publishing Group
2020
|
Online Access: | https://scholarbank.nus.edu.sg/handle/10635/175485 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Phenomenon of drain current instability on p-GaN gate AlGaN/GaN HEMTs
by: Chang, T.-F., et al.
Published: (2016) -
Enhanced ferroelectric switching characteristics of P(VDF-TrFE) for organic memory devices
by: Kusuma, Damar Yoga, et al.
Published: (2012) -
Investigation of gate leakage current mechanism in AlGaN/GaN high-electron-mobility transistors with sputtered TiN
by: Li, Yang, et al.
Published: (2017) -
AlGaN/GaN high electron mobility transistors with a low sub-threshold swing on free-standing GaN wafer
by: Liu, X, et al.
Published: (2020) -
Fabrication and characterization of advanced ALGaN/GaN high-electron-mobility transistors
by: LIU XINKE
Published: (2013)