Development and characterization of high-k gate stack for Ge MOSFETs
10.1149/1.3122115
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Main Authors: | Xie, R., Zhu, C. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/69900 |
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Institution: | National University of Singapore |
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