Spatially-programmable thermal processing module for 300 mm wafer processing

• Main Authors: Tay, A., Khiang Wee Lim, Ai Poh Loh, Woei Wan Tan, Weng Khuen Ho, Huang, A., Fu, J.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Subjects: 300 mm wafer processing; Lithography; Photoresist processing; Temperature control
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/71836
• Institution: National University of Singapore

10.1117/12.425238