Characterization of the plasma-induced effective mobility degradation of LATID NMOSFETs
International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings
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Main Authors: | Lou, C.L., Song, J., Tan, C.B., Chim, W.K., Chan, D.S.H., Pan, Y. |
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Other Authors: | ELECTRICAL ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/81388 |
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Institution: | National University of Singapore |
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