High-performance poly-silicon TFTs incorporating LaA1O3 as the gate dielectric
10.1109/LED.2005.848622
Saved in:
Main Authors: | Hung, B.F., Chiang, K.C., Huang, C.C., Chin, A., McAlister, S.P. |
---|---|
其他作者: | ELECTRICAL & COMPUTER ENGINEERING |
格式: | Article |
出版: |
2014
|
主題: | |
在線閱讀: | http://scholarbank.nus.edu.sg/handle/10635/82467 |
標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|
相似書籍
-
A novel self-aligned offset-gated polysilicon TFT using high-κ dielectric spacers
由: Xiong, Z., et al.
出版: (2014) -
The effect of IrO2-IrO2- Hf-LaAlO3 gate dielectric on the bias-temperature instability of 3-D GOI CMOSFETs
由: Yu, D.S., et al.
出版: (2014) -
Atomic Origin of Interface-Dependent Oxygen Migration by Electrochemical Gating at the LaAlO3-SrTiO3 Heterointerface
由: Dongsheng Song, et al.
出版: (2021) -
Synthesis of tellurium nanowires and their transport property
由: Liang, F., et al.
出版: (2014) -
Room-temperature fabricated thin-film transistors based on compounds with lanthanum and main family element boron
由: Xiao, Peng, et al.
出版: (2018)