Evolution of Schottky barrier heights at Ni/HfO2 interfaces
Applied Physics Letters
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Main Authors: | Li, Q., Dong, Y.F., Wang, S.J., Chai, J.W., Huan, A.C.H., Feng, Y.P., Ong, C.K. |
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Other Authors: | PHYSICS |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/96535 |
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Institution: | National University of Singapore |
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