Evolution of Schottky barrier heights at Ni/HfO2 interfaces

Applied Physics Letters

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Bibliographic Details
Main Authors: Li, Q., Dong, Y.F., Wang, S.J., Chai, J.W., Huan, A.C.H., Feng, Y.P., Ong, C.K.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/96535
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Institution: National University of Singapore

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