Study of leakage mechanisms of the copper/Black Diamond™ damascene process

10.1016/j.tsf.2004.05.051

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Bibliographic Details
Main Authors: Yiang, K.Y., Guo, Q., Yoo, W.J., Krishnamoorthy, A.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/57538
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Institution: National University of Singapore

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