Comparison between leakage currents in thin gate oxides subjected to X-ray radiation and electrical stress degradation

Comparison between leakage currents in thin gate oxides subjected to X-ray radiation and electrical stress degradation

10.1016/S0038-1101(00)00037-X

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書目詳細資料
Main Authors:	Cho, B.J., Kim, S.J., Ling, C.H., Joo, M.-S., Yeo, I.-S.
其他作者:	ELECTRICAL ENGINEERING
格式:	Article
出版:	2014
在線閱讀:	http://scholarbank.nus.edu.sg/handle/10635/61950
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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