Effects of poly-Si annealing on gate oxide charging damage in Poly-Si gate etching process
Materials Research Society Symposium - Proceedings
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Main Authors: | Chong, D., Yoo, W.J., Chan, L., See, A. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/70098 |
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Institution: | National University of Singapore |
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