Border-trap characterization in high-κ strained-Si MOSFETs
10.1109/LED.2007.902086
Saved in:
Main Authors: | Maji, D., Duttagupta, S.P., Rao, V.R., Yeo, C.C., Cho, B.-J. |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
|
Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/82018 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
The role of electron traps on the post-stress interface trap generation in hot-carrier stressed p-MOSFET's
by: Ang, D.S., et al.
Published: (2014) -
A modified charge-pumping method for the cxharacterization of interface-trap generation in MOSFETs
by: Huang, D., et al.
Published: (2014) -
Correlation between charge pumping method and direct-current current voltage method in p-type metal-oxide-semiconductor field-effect transistors
by: Jie, B.-B., et al.
Published: (2014) -
Charge carrier generation/trapping mechanisms in HfO2/SiO2 stack
by: Samanta, P., et al.
Published: (2014) -
A reassessment of ac hot-carrier degradation in deep-submicrometer LDD N-MOSFET
by: Ang, D.S., et al.
Published: (2014)