Effect of annealing on the composition and structure of HfO2 and nitrogen-incorporated HfO2

10.1016/j.tsf.2004.05.030

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Bibliographic Details
Main Authors: Yeo, C.C., Joo, M.S., Cho, B.J., Whang, S.J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82189
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Institution: National University of Singapore

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