Enhanced device performance of AlGaN/GaN HEMTs using HfO2 high-k dielectric for surface passivation and gate oxide
10.1088/0268-1242/22/5/011
Saved in:
Main Authors: | Liu, C., Chor, E.F., Tan, L.S. |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/82283 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Impact of Al2O3 incorporation on device performance of HfO2 gate dielectric AlGaN/GaN MIS-HFETs
by: Tian, F., et al.
Published: (2014) -
Improved electrical performance and thermal stability of HfO2 / Al2 O3 bilayer over HfO2 gate dielectric AlGaN/GaN MIS-HFETs
by: Tian, F., et al.
Published: (2014) -
Phenomenon of drain current instability on p-GaN gate AlGaN/GaN HEMTs
by: Chang, T.-F., et al.
Published: (2016) -
Material characterization of AlGaN/GaN based HEMT structures
by: Nur Hidayat Bin Hatwi
Published: (2014) -
Influences of gate drive on pulsed current collapse recovery in AlGaN/GaN power HEMTs
by: Li, Y., et al.
Published: (2014)